Khanbabaee Patekhour, Behnam: Depth resolved investigation of ion beam induced pattern formation on silicon using X-ray methodsTiefenaufgelöste Untersuchung der Ionenstrahl induzierten Musterbildung auf Silizium unter Verwendung von Röntgenverfahren. 2014
Inhalt
- Abstract
- Zusammenfassung
- Contents
- Glossary
- 1 Introduction
- 2 Ion beam induced pattern formation
- 2.1 Ion-solid interaction process
- 2.2 Theoretical approaches in surface morphology modulation
- 2.3 Bradley and Harper linear instability model
- 2.4 Patterning by ion bombardment with co-deposition of impurities
- 3 Surface and interface characterization methods
- 3.1 Refraction and reflection of X-rays from interfaces
- 3.2 X-ray diffraction theories
- 3.3 Experimental realization
- 3.4 X-ray absorption methods
- 3.5 Experimental procedure
- 4 Pattern formation on direct off-normal Fe ion irradiated Si(100) surfaces
- 4.1 Sample preparation
- 4.2 Surface and interface morphology analysis
- 4.3 Depth density profiling of Si(100) after irradiation with Fe ions
- 5 Near surface silicide formation after off-normal Fe ion irradiation of Si(100) surfaces
- 6 Recrystallization of Fe ion irradiated Si(100)
- 6.1 Effect of ion fluence on the phase composition
- 6.1.1 Structural evolution in high-fluence Fe ion irradiated Si upon thermal annealing
- 6.1.2 Structural evolution in low-fluence Fe ion irradiated Si upon thermal annealing
- 6.2 Strain analysis
- 7 Ion beam induced pattern formation on Si(001) with incorporation of metal atom impurities
- 7.1 Ion beam-induced pattern formation in presence of metal atom impurities using a broad-beam ion source
- 7.2 Ion beam induced pattern formation in presence of co-evaporation of Fe using a focused-beam ion source
- 8 Summary and conclusions
- Acknowledgements
- Bibliography